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CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH

BECKMAN, J; JACKMAN, RB; FOORD, JS; (1994) CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH. DIAMOND AND RELATED MATERIALS , 3 (4-6) pp. 602-607. 10.1016/0925-9635(94)90233-X.

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Type: Article
Title: CAPACITIVELY COUPLED RF PLASMA SOURCES - A VIABLE APPROACH FOR CVD DIAMOND GROWTH
Location: ALBUFEIRA, PORTUGAL
DOI: 10.1016/0925-9635(94)90233-X
Keywords: Science & Technology, Technology, Materials Science, Multidisciplinary, Materials Science, MATERIALS SCIENCE, MULTIDISCIPLINARY, CHEMICAL-VAPOR-DEPOSITION, MICROWAVE PLASMA, ION-BOMBARDMENT, GLOW-DISCHARGE, MAGNETIC-FIELD, ENERGY-DISTRIBUTIONS, FILM DEPOSITION, SPECTROSCOPY, SYSTEMS, MODEL
UCL classification: UCL > School of BEAMS
UCL > School of BEAMS > Faculty of Engineering Science
URI: http://discovery.ucl.ac.uk/id/eprint/138899
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