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Capacitively coupled r.f. plasma sources: a viable approach for CVD diamond growth?

Beckman, J and Jackman, RB and Foord, JS (1994) Capacitively coupled r.f. plasma sources: a viable approach for CVD diamond growth? Diamond and Related Materials , 3 (4-6) 602 - 607.

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Type:Article
Title:Capacitively coupled r.f. plasma sources: a viable approach for CVD diamond growth?
UCL classification:UCL > School of BEAMS > Faculty of Engineering Science > Electronic and Electrical Engineering

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