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The role of ion beam assisted surface chemistry in etching: adsorption and reactions of alkyl halides

Marshall, RD; Jackman, RB; (1992) The role of ion beam assisted surface chemistry in etching: adsorption and reactions of alkyl halides. In: (pp. pp. 23-28). Materials Research Society: Pittsburgh, US.

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Abstract

The form of ideal surface chemistry that is necessary for chemically assisted ion beam etching (CAIBE), with particular reference to in-situ processing is considered. Whilst to date CAIBE has been almost exclusively carried out with chlorine, distinct advantages exist if a compound that which displays spontaneous reactivity which is limited to one or two monolayers can be used. The role of alkyl halides in this scenario has been investigated through the use of surface spectroscopic probes to investigate the microscopic chemical and ion beam assisted reactivity that may be achieved. Dichloroethane has been found to display promising behaviour.

Type: Proceedings paper
Title: The role of ion beam assisted surface chemistry in etching: adsorption and reactions of alkyl halides
ISBN: 1558991638
DOI: 10.1557/PROC-268-23
Publisher version: http://dx.doi.org/10.1557/PROC-268-23
UCL classification: UCL > Provost and Vice Provost Offices
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
URI: http://discovery.ucl.ac.uk/id/eprint/138892
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