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Ion beam assisted etching of semiconductors: chemical modifications at the surface

Jackman, RB; Tyrrell, GC; (1991) Ion beam assisted etching of semiconductors: chemical modifications at the surface. In: (Proceedings) 8th International Conference on Ion and Plasma Assisted Techniques. (pp. 102 - ?).

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Type: Proceedings paper
Title: Ion beam assisted etching of semiconductors: chemical modifications at the surface
Event: 8th International Conference on Ion and Plasma Assisted Techniques
UCL classification: UCL > School of BEAMS > Faculty of Engineering Science > Electronic and Electrical Engineering
URI: http://discovery.ucl.ac.uk/id/eprint/138888
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