Jackman, RB and Tyrrell, GC (1991) Ion beam assisted etching of semiconductors: chemical modifications at the surface. In: (Proceedings) 8th International Conference on Ion and Plasma Assisted Techniques. (pp. 102 - ?).
Full text not available from this repository.
| Type: | Proceedings paper |
|---|---|
| Title: | Ion beam assisted etching of semiconductors: chemical modifications at the surface |
| Event: | 8th International Conference on Ion and Plasma Assisted Techniques |
| UCL classification: | UCL > School of BEAMS > Faculty of Engineering Science > Electronic and Electrical Engineering |
Archive Staff Only: edit this record