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VACUUM ULTRAVIOLET DEPOSITION OF SILICON DIELECTRICS

BOYD, IW; (1995) VACUUM ULTRAVIOLET DEPOSITION OF SILICON DIELECTRICS. SEMICONDUCTOR PROCESSING AND CHARACTERIZATION WITH LASERS - APPLICATIONS IN PHOTOVOLTAICS , 173- pp. 81-92.

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Type: Article
Title: VACUUM ULTRAVIOLET DEPOSITION OF SILICON DIELECTRICS
Location: MAX PLANCK INST, STUTTGART, GERMANY
Keywords: Science & Technology, Technology, Physical Sciences, Engineering, Electrical & Electronic, Instruments & Instrumentation, Optics, Physics, Condensed Matter, Engineering, Physics, ULTRAVIOLET, VACUUM ULTRAVIOLET, PHOTOCHEMISTRY, PHOTODEPOSITION, PHOTO-CVD, DIELECTRICS, SILICON DIOXIDE, SILICON NITRIDE, SILICON OXYNITRIDE, EXCIMER LAMP, THIN FILMS, MULTILAYERS
UCL classification: UCL > Provost and Vice Provost Offices
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology
URI: http://discovery.ucl.ac.uk/id/eprint/1384203
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