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Excimer laser-induced surface activation of alumina for electroless metal deposition

Zhang, JY; Boyd, IW; Esrom, H; (1997) Excimer laser-induced surface activation of alumina for electroless metal deposition. Applied Surface Science , 109-11 pp. 253-258. 10.1016/S0169-4332(96)00666-6.

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Abstract

Selective metal deposition on alumina (Al 2 O 3 ) is described. This method employs ultraviolet (UV) excimer laser irradiation to decompose Al 2 O 3 in air. After immersion in an electroless bath, the metal films of Cu are deposited only on the UV exposed area. This direct UV-induced decomposition and local activation of the substrate material does not require the use of additional precursors for subsequent electroless metal deposition represents as traditional approaches to metallisation require. The degree of surface modification of the alumina, specifically its dependence on the laser fluence and number of pulses, is described for the first time.

Type: Article
Title: Excimer laser-induced surface activation of alumina for electroless metal deposition
DOI: 10.1016/S0169-4332(96)00666-6
UCL classification: UCL > Provost and Vice Provost Offices
UCL > Provost and Vice Provost Offices > UCL BEAMS
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology
URI: http://discovery.ucl.ac.uk/id/eprint/1384182
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