UCL logo

UCL Discovery

UCL home » Library Services » Electronic resources » UCL Discovery

Characterisation of process variables for ultraviolet assisted injection liquid source chemical vapour deposition (UVILS-CVD) of tantalum pentoxide films

Beechinor, JT; Mooney, MB; Kelly, PV; Crean, GM; Zhang, JY; Boyd, IW; Paillous, M; ... Sénateur, JP; + view all (1999) Characterisation of process variables for ultraviolet assisted injection liquid source chemical vapour deposition (UVILS-CVD) of tantalum pentoxide films. Materials Research Society Symposium - Proceedings , 567 pp. 509-514.

Full text not available from this repository.

Abstract

The characterisation of the physical and chemical properties of tantalum pentoxide (Ta2O5) films, deposited on silicon using a newly developed low temperature deposition technique - ultraviolet assisted injection liquid source chemical vapour deposition (UVILSCVD), is reported. The effect of deposition parameters including substrate temperature, oxidising agent (N2O) flow, precursor carrier gas (Ar) flow, number of drops of precursor injected and precursor solution concentration is discussed. Spectroscopic ellipsometry (SE) was used to determine the refractive index and thickness of the Ta2O5films. The film thickness was observed to increase with temperature, number of injected drops and precursor solution percentage, while the refractive index was found to be most sensitive to temperature. SIMS measurements showed good agreement with extracted thickness values. Fourier transform infrared spectroscopy was used to identify and monitor Ta2O5(pentoxide), TaO2and TaO (sub-oxide) formation via curve fitting analysis of spectral features. Results showed increased sub-oxide formation as a function of increasing pressure and as a function of decreasing N2O flow, precursor solution concentration and number of drops injected. The summation of the areas under peaks characteristic of the tantalum-oxygen bonding correlated well with the thicknesses determined by spectroscopic ellipsometry. The FTIR spectra revealed a dramatic increase in the proportion of suboxide in the absence of the oxidising gas.

Type: Article
Title: Characterisation of process variables for ultraviolet assisted injection liquid source chemical vapour deposition (UVILS-CVD) of tantalum pentoxide films
URI: http://discovery.ucl.ac.uk/id/eprint/1384117
Downloads since deposit
0Downloads
Download activity - last month
Download activity - last 12 months
Downloads by country - last 12 months

Archive Staff Only

View Item View Item