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Photo-induced CVD of tantalum pentoxide dielectric films using an injection liquid source

Zhang, JY; Boyd, IW; Mooney, MB; Hurley, PK; O'Sullivan, BJ; Beechinor, JT; Kelly, PV; ... Senateur, JP; + view all (1999) Photo-induced CVD of tantalum pentoxide dielectric films using an injection liquid source. ULTRATHIN SIO2 AND HIGH-K MATERIALS FOR ULSI GATE DIELECTRICS , 567 pp. 397-402.

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Type: Article
Title: Photo-induced CVD of tantalum pentoxide dielectric films using an injection liquid source
Location: SAN FRANCISCO, CA
Keywords: Science & Technology, Technology, Computer Science, Hardware & Architecture, Engineering, Electrical & Electronic, Materials Science, Multidisciplinary, Materials Science, Coatings & Films, Computer Science, Engineering, Materials Science, CHEMICAL-VAPOR-DEPOSITION, AMORPHOUS TA2O5 FILMS, THIN-FILMS, ELECTRICAL-PROPERTIES, OXIDE-FILMS, MEMORIES, LAMP
UCL classification: UCL > School of BEAMS
UCL > School of BEAMS > Faculty of Maths and Physical Sciences
UCL > School of BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology
URI: http://discovery.ucl.ac.uk/id/eprint/1384116
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