Mehonic, A; Wojdak, M; Hudziak, S; Kenyon, AJ; Cueff, S; Labbé, C; ... Garrido, B; + view all Mehonic, A; Wojdak, M; Hudziak, S; Kenyon, AJ; Cueff, S; Labbé, C; Rizk, R; Jambois, O; Garrido, B; - view fewer (2012) Intrinsic resistive switching in bulk SiO films. In: Materials Research Society Symposium Proceedings. (pp. 147 - 152).
Full text not available from this repository.
We report a study of resistive switching in a silicon-based memristor/resistive RAM (RRAM) device in which the active layer is silicon-rich silica. The resistive switching phenomenon is an intrinsic property of the silicon-rich oxide layer and does not depend on the diffusion of metallic ions to form conductive paths. Both unipolar and bipolar programming is demonstrated. Switching exhibits the pinched hysteresis I/V loop characteristic of RRAM/memristive systems, and on/off resistance ratios of 10:1 or higher can be easily achieved. Scanning Tunnelling Microscopy suggests that switchable conductive pathways are 10nm in diameter or smaller. © 2012 Materials Research Society.
|Title:||Intrinsic resistive switching in bulk SiO films|
|UCL classification:||UCL > School of BEAMS > Faculty of Engineering Science > Electronic and Electrical Engineering|
Archive Staff Only: edit this record