Electron interaction cross sections for CF3I, C2F4 and CFx(x=1-3) radicals.
Journal of Physical and Chemical Reference Data
The supply of absolute electron-impact cross sections for molecular targets and radicals is extremely important for developing plasma reactors and testing different types of etching gases. Current demand for such models is high as the industry aims to replace traditional plasma processing gases with less polluting species. New theoretical electron impact cross sections at typical etching plasma energies (sub 10 eV) are presented for the CFx (x=1-3) active radical species in a form suitable for plasma modeling. The available experimental and theoretical data are summarised for two potential feed gases, CF3I and C2F4. This data covers recommended cross sections for electron scattering (total, excitation, momentum transfer and elastic integral), electron impact dissociation and dissociative electron attachment, wherever possible. Numerical values are given as tables in the paper and are also placed in the electronic archive.
|Title:||Electron interaction cross sections for CF3I, C2F4 and CFx(x=1-3) radicals|
|Open access status:||An open access version is available from UCL Discovery|
|Additional information:||Copyright 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.|
|Keywords:||electron molecule collisions, cross sections, resonances, electronic excitation, dissociative electron attachment, ionisation, technological plasmas|
|UCL classification:||UCL > School of BEAMS > Faculty of Maths and Physical Sciences > Physics and Astronomy|
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