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Noncontact atomic force microscopy imaging of ultrathin Al2O3 on NiAl(110)

Pang, CL; Raza, H; Haycock, SA; Thornton, G; (2002) Noncontact atomic force microscopy imaging of ultrathin Al2O3 on NiAl(110). PHYS REV B , 65 (20) , Article 201401. 10.1103/PhysRevB.65.201401.

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Abstract

Noncontact atomic force microscopy (NC-AFM) has been used to image ultrathin film Al2O3 on NiAl(110). Atomic scale rows were observed with a 9 A periodicity. This provides support for a previous scanning tunneling microscopy study that concluded that the rows arise from the oxide rather than the underlying substrate. NC-AFM data image domain boundaries in the oxide film as either trenches or ridges, depending on the state of the tip. This suggests that NC-AFM does not simply trace the topography of the surface.

Type:Article
Title:Noncontact atomic force microscopy imaging of ultrathin Al2O3 on NiAl(110)
DOI:10.1103/PhysRevB.65.201401
Keywords:SCANNING-TUNNELING-MICROSCOPY, ALUMINUM-OXIDE FILMS, SURFACE, TIO2(110), OXIDATION, DEFECTS
UCL classification:UCL > School of BEAMS > Faculty of Maths and Physical Sciences > Chemistry

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