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Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction

Hyett, G; Darr, JA; Mills, A; Parkin, IP; (2010) Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction. CHEM VAPOR DEPOS , 16 (10-12) 301 - 304. 10.1002/cvde.201004298.

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Abstract

We report the observation of hydrogen production from photodiodes, when irradiated with UV light. These photodiodes were composed of a stainless steel substrate, with a TiO2 photocatalyst deposited suing APCVD on one side and Pt deposited using sputter coating on the other. In contrast similar devices made using a titanium substrate show no measurable H-2 production.

Type: Article
Title: Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction
DOI: 10.1002/cvde.201004298
Keywords: CHEMICAL-VAPOR-DEPOSITION, SEMICONDUCTOR PHOTOCATALYSIS, WATER-PURIFICATION, COATINGS, TIO2, PHOTOLYSIS, DIOXIDE, ANATASE, GLASS
UCL classification: UCL > School of BEAMS > Faculty of Maths and Physical Sciences
UCL > School of BEAMS > Faculty of Maths and Physical Sciences > Chemistry
URI: http://discovery.ucl.ac.uk/id/eprint/1301629
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