Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction.
CHEM VAPOR DEPOS
301 - 304.
We report the observation of hydrogen production from photodiodes, when irradiated with UV light. These photodiodes were composed of a stainless steel substrate, with a TiO2 photocatalyst deposited suing APCVD on one side and Pt deposited using sputter coating on the other. In contrast similar devices made using a titanium substrate show no measurable H-2 production.
|Title:||Substrate-Dependant Ability of Titanium(IV) Oxide Photocatalytic Thin Films Prepared by Thermal CVD to Generate Hydrogen Gas from a Sacrificial Reaction|
|Keywords:||CHEMICAL-VAPOR-DEPOSITION, SEMICONDUCTOR PHOTOCATALYSIS, WATER-PURIFICATION, COATINGS, TIO2, PHOTOLYSIS, DIOXIDE, ANATASE, GLASS|
|UCL classification:||UCL > School of BEAMS
UCL > School of BEAMS > Faculty of Maths and Physical Sciences
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