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Photolithographically manufactured acrylate multimode optical waveguide loss design rules

Wang, K.; Selviah, D.R.; Papakonstantinou, I.; Yu, G.; Baghsiahi, H.; Fernández, F.A.; (2008) Photolithographically manufactured acrylate multimode optical waveguide loss design rules. Presented at: 2nd Electronics System-Integration Technology Conference, ESTC 2008, Greenwich, London, UK. Green open access

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Type: Conference item (Presentation)
Title: Photolithographically manufactured acrylate multimode optical waveguide loss design rules
Event: 2nd Electronics System-Integration Technology Conference, ESTC 2008
Location: Greenwich, London, UK
Dates: 1 - 4 September 2008
Open access status: An open access version is available from UCL Discovery
Publisher version: http://www.estc.biz/
Language: English
UCL classification: UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Engineering Science > Dept of Electronic and Electrical Eng
UCL > Provost and Vice Provost Offices > UCL BEAMS > Faculty of Maths and Physical Sciences > Dept of Physics and Astronomy
URI: https://discovery.ucl.ac.uk/id/eprint/12808
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