Wilson, HF; Warschkow, O; Marks, NA; Schofield, SR; Curson, NJ; Smith, PV; ... Simmons, MY; + view all Wilson, HF; Warschkow, O; Marks, NA; Schofield, SR; Curson, NJ; Smith, PV; Radny, MW; McKenzie, DR; Simmons, MY; - view fewer (2004) Phosphine dissociation on the Si(001) surface. PHYS REV LETT , 93 (22) , Article 226102. 10.1103/PhysRevLett.93.226102.
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Density functional calculations are performed to identify features observed in STM experiments after phosphine (PH3) dosing of the Si(001) surface. On the basis of a comprehensive survey of possible structures, energetics, and simulated STM images, three prominent STM features are assigned to structures containing surface bound PH2, PH, and P, respectively. Collectively, the assigned features outline for the first time a detailed mechanism of PH3 dissociation and P incorporation on Si(001).
|Title:||Phosphine dissociation on the Si(001) surface|
|Open access status:||An open access publication. A version is also available from UCL Discovery.|
|Additional information:||2004 The American Physical Society|
|Keywords:||MOLECULAR-DYNAMICS, ADSORPTION, SI(100), PH3, SILICON, STM|
|UCL classification:||UCL > School of BEAMS > Faculty of Maths and Physical Sciences > London Centre for Nanotechnology|
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