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Low cost transparent SU-8 membrane mask for deep X-ray lithography

Cabrini, S; Perennes, F; Marmiroli, B; Olivo, A; Carpentiero, A; Kumar, R; Candeloro, P; (2005) Low cost transparent SU-8 membrane mask for deep X-ray lithography. Presented at: 5th International Workshop on High Aspect Ratio Micro Structure Technolohy (HARMST), Monterey, CA.

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Abstract

Deep X-ray lithography masks require good transparency and mechanical resistance to the intense synchrotron X-ray beam, large active areas (cm)(2) and compatibility with the standard fabrication processes (optical lithography and gold electroforming). Moreover higher resolution can be achieved with low roughness flat membrane. Furthermore multiple aligned exposures require an optically transparent material. Diamond like Carbon membranes fulfill those requirements but have a prohibitive cost. Our approach consists in using an SU-8 epoxy resin layer as membrane material. In this communication the different steps of the fabrication process will be presented, as well as the results obtained using the mask for particular applications.

Type: Conference item (UNSPECIFIED)
Title: Low cost transparent SU-8 membrane mask for deep X-ray lithography
Event: 5th International Workshop on High Aspect Ratio Micro Structure Technolohy (HARMST)
Location: Monterey, CA
Dates: June 2003 - June 2003
DOI: 10.1007/s00542-004-0473-5
Publisher version: http://www.springer.com/engineering/electronics/jo...
UCL classification: UCL > School of BEAMS > Faculty of Engineering Science
UCL > School of BEAMS > Faculty of Engineering Science > Medical Physics and Bioengineering
URI: http://discovery.ucl.ac.uk/id/eprint/116798
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